Photopatternable interfaces for block copolymer lithography

Michael J Maher, Christopher M. Bates, Gregory Blachut, Matthew C. Carlson, Jeffrey L. Self, Dustin W Janes, William J. Durand, Austin P. Lane, Christopher J. Ellison, C. Grant Willson

Research output: Contribution to journalArticlepeer-review

19 Scopus citations

Abstract

Directly photopatternable interfaces are introduced that facilitate two-dimensional spatial control of block copolymer (BCP) orientation in thin films. Copolymers containing an acid labile monomer were synthesized, formulated with a photoacid generator (PAG), and coated to create grafted surface treatments (GSTs). These as-cast GST films are either inherently neutral or preferential (but not both) to lamella-forming poly(styrene-block- trimethylsilylstyrene) (PS-b-PTMSS). Subsequent contact printing and baking produced GSTs with submicron chemically patterned gratings. The catalytic reaction of the photoacid generated in the UV-exposed regions of the GSTs changed the interfacial interactions between the BCP and the GST in one of two ways: from neutral to preferential ("N2P") or preferential to neutral ("P2N"). When PS-b-PTMSS was thermally annealed between a chemically patterned GST and a top coat, alternating regions of perpendicular and parallel BCP lamellae were formed.

Original languageEnglish (US)
Pages (from-to)824-828
Number of pages5
JournalACS Macro Letters
Volume3
Issue number8
DOIs
StatePublished - Aug 19 2014

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