Plasma and surface diagnostics during plasma-enhanced chemical vapor deposition of SiO₂ from SiH₄/O₂/Ar discharges

Engineering & Materials Science

• Plasma diagnostics 100%
• Plasma enhanced chemical vapor deposition 79%
• Silanes 39%
• Fluxes 25%
• Langmuir probes 11%
• Film growth 9%
• Substrates 8%
• Fourier transform infrared spectroscopy 7%
• Gas mixtures 7%
• Oxidation 5%
• Oxides 5%
• Oxygen 5%

Physics & Astronomy

• plasma diagnostics 67%
• vapor deposition 42%
• silanes 27%
• fragments 15%
• electrostatic probes 6%
• hydrides 6%
• gas mixtures 5%
• light emission 5%
• infrared spectroscopy 5%
• oxidation 4%
• oxides 3%
• oxygen 3%
• silicon 3%

Chemical Compounds

• Plasma Enhanced Chemical Vapour Deposition 67%
• Liquid Film 21%
• Surface 17%
• Silane 17%
• Silicon Hydride 9%
• Attenuated Total Reflection 6%
• Hydroxyl 5%
• Probe 3%
• Fourier Transform Infrared Spectroscopy 3%
• Oxide 3%
• Gas 3%
• Oxidation Reaction 2%