Post-Si CMOS: III-V n-MOSFETs with high-k gate dielectrics

Yanning Sun, S. J. Koester, E. W. Kiewra, J. P. De Souza, N. Ruiz, J. J. Bucchignano, A. Callegari, K. E. Fogel, D. K. Sadana, J. Fompeyrine, D. J. Webb, J. P. Locquet, M. Sousa, R. Germann

Research output: Chapter in Book/Report/Conference proceedingConference contribution

3 Scopus citations

Fingerprint

Dive into the research topics of 'Post-Si CMOS: III-V n-MOSFETs with high-k gate dielectrics'. Together they form a unique fingerprint.

Engineering & Materials Science