Real-time monitoring of surface chemistry during plasma processing

E. S. Aydil, R. A. Gottscho, Y. J. Chabal

Research output: Contribution to journalArticlepeer-review

30 Scopus citations

Abstract

Techniques available for real time, in situ monitoring of surface chemistry during plasma processing are reviewed. Emphasis is given to recent uses of attenuated-total-reflection Fourier transform infrared (ATR-FTIR) spectroscopy to study surface bond vibrations during plasma cleaning and passivation of Si and GaAs surfaces. Examples are chosen to demonstrate the utility of real-time monitoring of surfaces for developing and optimizing plasma processes used in manufacturing of electronic and optoelectronic devices.

Original languageEnglish (US)
Pages (from-to)1381-1388
Number of pages8
JournalPure and Applied Chemistry
Volume66
Issue number6
DOIs
StatePublished - 1994

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