Recent developments in porous silicon substrates for RF/microwave applications

Research output: Chapter in Book/Report/Conference proceedingConference contribution

2 Scopus citations

Abstract

Highly integrated system design is sought in silicon (Si) substrates due to the potential cost savings from volume manufacturing. For GHz applications two research efforts in silicon have evolved, BiCMOS in SiGe and CMOS in Si, that utilize of high and low resistivity silicon materials, respectively. In order to integrate active and passive designs in CMOS grade substrates with conductive and insulating features, multilayer and substrate modification methods have been investigated. This paper will present an overview of one substrate modification method, porous silicon, and recent electrical characterization data of GHz interconnect performance on dielectric capped and oxide converted forms of the material. In addition, highlights of several RF circuit demonstrations will be presented on lumped element, active circuit, and packaging performance.

Original languageEnglish (US)
Title of host publication2004 Topical Meeting on Silicon Monolithic Integrated Circuits in RF Systems
Subtitle of host publicationDigest of Papers
EditorsJ.D. Cressler, J. Papapolymerou
Pages155-158
Number of pages4
StatePublished - Dec 1 2004
Event2004 Topical Meeting on Silicon Monolithic Integrated Circuits in RF Systems: Digest of Papers - Atlanta, GA, United States
Duration: Sep 8 2004Sep 10 2004

Publication series

Name2004 Topical Meeting on Silicon Monolithic Integrated Circuits in RF Systems: Digest of Papers

Other

Other2004 Topical Meeting on Silicon Monolithic Integrated Circuits in RF Systems: Digest of Papers
Country/TerritoryUnited States
CityAtlanta, GA
Period9/8/049/10/04

Keywords

  • Coplanar waveguides
  • Low resistivity silicon
  • OPS
  • Porous silicon
  • Slow wave mode

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