Regioselective Atomic Layer Deposition in Metal-Organic Frameworks Directed by Dispersion Interactions

Leighanne C. Gallington; In Soo Kim; Wei Guang Liu; Andrey A. Yakovenko; Ana E. Platero-Prats; Zhanyong Li; Timothy C. Wang; Joseph T. Hupp; Omar K. Farha; Donald G. Truhlar; Alex B.F. Martinson; Karena W. Chapman

doi:10.1021/jacs.6b08711

Regioselective Atomic Layer Deposition in Metal-Organic Frameworks Directed by Dispersion Interactions

Leighanne C. Gallington, In Soo Kim, Wei Guang Liu, Andrey A. Yakovenko, Ana E. Platero-Prats, Zhanyong Li, Timothy C. Wang, Joseph T. Hupp, Omar K. Farha, Donald G. Truhlar, Alex B.F. Martinson, Karena W. Chapman

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Abstract

The application of atomic layer deposition (ALD) to metal-organic frameworks (MOFs) offers a promising new approach to synthesize designer functional materials with atomic precision. While ALD on flat substrates is well established, the complexity of the pore architecture and surface chemistry in MOFs present new challenges. Through in situ synchrotron X-ray powder diffraction, we visualize how the deposited atoms are localized and redistribute within the MOF during ALD. We demonstrate that the ALD is regioselective, with preferential deposition of oxy-Zn(II) species within the small pores of NU-1000. Complementary density functional calculations indicate that this startling regioselectivity is driven by dispersion interactions associated with the preferential adsorption sites for the organometallic precursors prior to reaction.

Original language	English (US)
Pages (from-to)	13513-13516
Number of pages	4
Journal	Journal of the American Chemical Society
Volume	138
Issue number	41
DOIs	https://doi.org/10.1021/jacs.6b08711
State	Published - Oct 19 2016

Bibliographical note

Funding Information:
This work was supported as part of the Inorganometallic Catalysis Design Center, an Energy Frontier Research Center funded by the U.S. Department of Energy (DOE), Office of Science, Basic Energy Sciences, under Award No. DESC0012702. It used resources of the Advanced Photon Source, a U.S. DOE Office of Science User Facility operated for the DOE Office of Science by Argonne National Laboratory under Contract No. DE-AC02-06CH11357. A.E.P.-P. acknowledges

Publisher Copyright:
© 2016 American Chemical Society.

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Gallington, L. C., Kim, I. S., Liu, W. G., Yakovenko, A. A., Platero-Prats, A. E., Li, Z., Wang, T. C., Hupp, J. T., Farha, O. K., Truhlar, D. G., Martinson, A. B. F., & Chapman, K. W. (2016). Regioselective Atomic Layer Deposition in Metal-Organic Frameworks Directed by Dispersion Interactions. Journal of the American Chemical Society, 138(41), 13513-13516. https://doi.org/10.1021/jacs.6b08711

Gallington, LC, Kim, IS, Liu, WG, Yakovenko, AA, Platero-Prats, AE, Li, Z, Wang, TC, Hupp, JT, Farha, OK, Truhlar, DG, Martinson, ABF & Chapman, KW 2016, 'Regioselective Atomic Layer Deposition in Metal-Organic Frameworks Directed by Dispersion Interactions', Journal of the American Chemical Society, vol. 138, no. 41, pp. 13513-13516. https://doi.org/10.1021/jacs.6b08711

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Regioselective Atomic Layer Deposition in Metal-Organic Frameworks Directed by Dispersion Interactions

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Energy Frontier Research Center For Inorganometallic Catalyst Design (DE-SC0012702)

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Regioselective Atomic Layer Deposition in Metal-Organic Frameworks Directed by Dispersion Interactions

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