Self-folding nanostructures with imprint patterned surfaces (SNIPS)

Hye Rin Kwag, Jeong Hyun Cho, Si Young Park, Jaehyun Park, David H. Gracias

Research output: Contribution to journalArticlepeer-review

9 Scopus citations

Abstract

A significant need in nanotechnology is the development of methods to mass-produce three-dimensional (3D) nanostructures and their ordered assemblies with patterns of functional materials such as metals, ceramics, device grade semiconductors, and polymers. While top-down lithography approaches can enable heterogeneous integration, tunability, and significant material versatility, these methods enable inherently two-dimensional (2D) patterning. Bottom-up approaches enable mass-production of 3D nanostructures and their assemblies but with limited precision, and tunability in surface patterning. Here, we demonstrate a methodology to create Self-folding Nanostructures with Imprint Patterned Surfaces (SNIPS). By a variety of examples, we illustrate that SNIPS, either individually or in ordered arrays, are mass-producible and have significant tunability, material heterogeneity, and patterning precision.

Original languageEnglish (US)
Pages (from-to)61-71
Number of pages11
JournalFaraday Discussions
Volume191
DOIs
StatePublished - 2016

Bibliographical note

Funding Information:
We acknowledge funding from the National Science Foundation (Grant: CMMI-1200241). Research performed in part at the NIST Center for Nanoscale Science and Technology

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