Silicon hydride composition of plasma-deposited hydrogenated amorphous and nanocrystalline silicon films and surfaces

Engineering & Materials Science

• Nanocrystalline silicon 100%
• Amorphous silicon 73%
• Silanes 68%
• Plasmas 49%
• Chemical analysis 34%
• Dangling bonds 17%
• Vibrational spectra 15%
• Dilution 10%
• Plasma enhanced chemical vapor deposition 6%
• Hydrides 6%
• Fourier transform infrared spectroscopy 6%
• Natural frequencies 4%

Chemical Compounds

• Silicon Hydride 83%
• Amorphous Silicon 72%
• Liquid Film 25%
• Surface 17%
• Dangling Bond 12%
• Vibrational Frequency 9%
• Dilution 7%
• Plasma Enhanced Chemical Vapour Deposition 5%
• Attenuated Total Reflection 5%
• Hydride 4%
• Dissociation 3%
• Fourier Transform Infrared Spectroscopy 2%
• Amount 2%

Physics & Astronomy

• silicon films 57%
• hydrides 54%
• amorphous silicon 49%
• silicon 28%
• dihydrides 22%
• dilution 10%
• surface reactions 5%
• infrared spectroscopy 4%
• resonant frequencies 4%
• dissociation 4%
• vapor deposition 4%