SiO2 coating of silver nanoparticles by photoinduced chemical vapor deposition

Adam M. Boies, Jeffrey T. Roberts, Steven L. Girshick, Bin Zhang, Toshitaka Nakamura, Amane Mochizuki

Research output: Contribution to journalArticlepeer-review

38 Scopus citations

Abstract

Gas-phase silver nanoparticles were coated with silicon dioxide (SiO 2) by photoinduced chemical vapor deposition (photo-CVD). Silver nanoparticles, produced by inert gas condensation, and a SiO2 precursor, tetraethylorthosilicate (TEOS), were exposed to vacuum ultraviolet (VUV) radiation at atmospheric pressure and varying temperatures. The VUV photons dissociate the TEOS precursor, initiating a chemical reaction that forms SiO2 coatings on the particle surfaces. Coating thicknesses were measured for a variety of operation parameters using tandem differential mobility analysis and transmission electron microscopy. The chemical composition of the particle coatings was analyzed using energy dispersive x-ray spectrometry and Fourier transform infrared spectroscopy. The highest purity films were produced at 300-400 °C with low flow rates of additional oxygen. The photo-CVD coating technique was shown to effectively coat nanoparticles and limit core particle agglomeration at concentrations up to 10 7particlescm-3.

Original languageEnglish (US)
Article number295604
JournalNanotechnology
Volume20
Issue number29
DOIs
StatePublished - 2009

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