TY - GEN
T1 - SiO2 nanorod thin film encapsulated by Al2O 3 with atomic layer deposition and its optical application
AU - Kim, Sangho S.
AU - Gabriel, Nicholas T.
AU - Song, Woo Bin
AU - Talghader, Joseph J.
PY - 2008
Y1 - 2008
N2 - Low refractive index materials such as SiO2 nanorods or nanoporous SiO2 (np-SiO2) and MgF2 have been attractive for use in various types of optical coatings. Due to the high porosity of the films, however, the material properties of these films are unstable. This phenomenon is confirmed in dry versus humid ambient where both the coefficient of thermal expansion (CTE) and refractive index change dramatically. We report here that the properties of np-SiO2 can be stabilized by depositing a cap layer of Al2O3 using Atomic Layer Deposition (ALD) on top. This stabilizing ability is demonstrated successfully for single layer and distributed Bragg reflectors (DBR). With this method, one can pattern nanoporous sensors so that some regions are stable for packaging while others are exposed to show enhanced interactions with environment for sensing.
AB - Low refractive index materials such as SiO2 nanorods or nanoporous SiO2 (np-SiO2) and MgF2 have been attractive for use in various types of optical coatings. Due to the high porosity of the films, however, the material properties of these films are unstable. This phenomenon is confirmed in dry versus humid ambient where both the coefficient of thermal expansion (CTE) and refractive index change dramatically. We report here that the properties of np-SiO2 can be stabilized by depositing a cap layer of Al2O3 using Atomic Layer Deposition (ALD) on top. This stabilizing ability is demonstrated successfully for single layer and distributed Bragg reflectors (DBR). With this method, one can pattern nanoporous sensors so that some regions are stable for packaging while others are exposed to show enhanced interactions with environment for sensing.
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U2 - 10.1109/NANO.2008.237
DO - 10.1109/NANO.2008.237
M3 - Conference contribution
AN - SCOPUS:55349101257
SN - 9781424421046
T3 - 2008 8th IEEE Conference on Nanotechnology, IEEE-NANO
SP - 793
EP - 796
BT - 2008 8th IEEE Conference on Nanotechnology, IEEE-NANO
T2 - 2008 8th IEEE Conference on Nanotechnology, IEEE-NANO
Y2 - 18 August 2008 through 21 August 2008
ER -