Sputtered metal oxide broken gap junctions

Stephen Campbell, Forrest Johnson, Sreejith Karthikeyan, Sang Ho Song, Richard Liptak, Brian Benton

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Broken gap metal oxide tunnel junctions have been created by sputtering. Using a ceramic ZnO-SnO2 target and a reactively sputtered copper target we deposited ZnSnO3 and Cu2O for the ntype and p-type layers, respectively. AlCuO2 can also be used for the p-type layer. It shows better thermal uniformity and improved optical transmittance, but somewhat higher specific junction resistance. The band structure of the respective materials have theoretical work functions which line up with the band structure for a tandem solar cell and quantum dot LED applications. Asdeposited films demonstrated a dependence of the I-V profile with post-deposition rapid thermal anneal. Total junction specific contact resistances under 1 ohm-cm2 have been achieved.

Original languageEnglish (US)
Title of host publicationECS Transactions
PublisherElectrochemical Society Inc.
Pages363-372
Number of pages10
Volume61
Edition2
DOIs
StatePublished - 2014
Event6th International Symposium on Dielectrics for Nanosystems: Materials Science, Processing, Reliability and Manufacturing - 225th ECS Meeting - Orlando, United States
Duration: May 11 2014May 15 2014

Other

Other6th International Symposium on Dielectrics for Nanosystems: Materials Science, Processing, Reliability and Manufacturing - 225th ECS Meeting
Country/TerritoryUnited States
CityOrlando
Period5/11/145/15/14

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