SrSnO Metal-Semiconductor Field-Effect Transistor with GHz Operation

Jiaxuan Wen, V. R. Saran Kumar Chaganti, Tristan K. Truttmann, Fengdeng Liu, Bharat Jalan, Steven J. Koester

Research output: Contribution to journalArticlepeer-review

13 Scopus citations

Abstract

A SrSnO3 high-frequency field-effect transistor (FET) is demonstrated. The device structure consists of a recessed Schottky-gate FET with a heavily doped cap layer. DC measurements on devices with 0.5- μm gate length and 4- μm source/drain spacing show a maximum drain current of 53 mA/mm and a maximum transconductance of 43.2 mS/mm. Radio frequency (RF) characterization reveals a cut-off frequency, fT , of 1.31 GHz (0.97 GHz) and a maximum oscillation frequency, fmax, of 3.25 (3.25) GHz, after (before) de-embedding. These results represent an important advancement in developing perovskite materials for RF applications.

Original languageEnglish (US)
Article number9269996
Pages (from-to)74-77
Number of pages4
JournalIEEE Electron Device Letters
Volume42
Issue number1
DOIs
StatePublished - Jan 2021
Externally publishedYes

Bibliographical note

Publisher Copyright:
© 1980-2012 IEEE.

Keywords

  • MESFET
  • RF
  • SrSnOâ
  • perovskite
  • stannate

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