Static SIMS and XPS study of water plasma exposed tin oxide films

Engineering & Materials Science

• Secondary ion mass spectrometry 100%
• Tin oxides 91%
• Oxide films 82%
• X ray photoelectron spectroscopy 81%
• Plasmas 61%
• Water 36%
• Ions 20%
• Dehydration 18%
• Vacuum 13%
• Electronic structure 10%
• Air 8%
• Annealing 7%
• Contamination 7%
• Oxides 6%
• Carbon 5%

Physics & Astronomy

• secondary ion mass spectrometry 68%
• tin oxides 64%
• oxide films 59%
• photoelectron spectroscopy 54%
• water 37%
• x rays 29%
• dehydration 18%
• ions 10%
• vacuum 9%
• air 8%
• contamination 6%
• reactors 5%
• electronic structure 5%
• atmospheres 5%
• carbon 4%
• oxides 4%
• annealing 4%

Chemical Compounds

• Tin Oxide 71%
• X-Ray Photoelectron Spectroscopy 46%
• Plasma 41%
• Liquid Film 32%
• Dehydroxylation 28%
• Surface 21%
• Secondary Ion 18%
• Dehydration 12%
• Vacuum 11%
• Reaction Yield 6%
• Annealing 5%
• Electronic State 5%
• Oxide 3%
• Carbon Atom 3%
• Ion 2%