Engineering & Materials Science
Spectrometry
100%
Titanium
73%
Rutherford backscattering spectroscopy
70%
Thermionic emission
68%
Low pressure chemical vapor deposition
62%
Capacitors
60%
Metallorganic chemical vapor deposition
60%
Electrodes
58%
Silicon wafers
46%
Oxide semiconductors
45%
Platinum
44%
Water vapor
42%
Diffraction
41%
Leakage currents
41%
Permittivity
38%
Thin films
36%
X rays
34%
Oxygen
30%
Silicon
30%
Substrates
26%
Metals
24%
Electric potential
19%
Physics & Astronomy
capacitors
66%
titanium
63%
thermionic emission
44%
electrode materials
44%
characterization
42%
silicon
41%
spectroscopy
39%
metal oxide semiconductors
39%
water vapor
38%
platinum
37%
metalorganic chemical vapor deposition
36%
backscattering
34%
x ray diffraction
32%
low pressure
31%
leakage
31%
breakdown
29%
wafers
28%
permittivity
26%
electrodes
23%
oxygen
23%
electric potential
20%
thin films
19%