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Dive into the research topics of 'Sub-10-nm half-pitch electron-beam lithography by using poly(methyl methacrylate) as a negative resist'. Together they form a unique fingerprint.- Sort by
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Huigao Duan, Donald Winston, Joel K.W. Yang, Bryan Cord, Vitor R. Manfrinato, Karl K. Berggren
Research output: Contribution to journal › Article › peer-review