Sub-10-nm half-pitch electron-beam lithography by using poly(methyl methacrylate) as a negative resist

Huigao Duan, Donald Winston, Joel K.W. Yang, Bryan Cord, Vitor R. Manfrinato, Karl K. Berggren

Research output: Contribution to journalArticlepeer-review

71 Scopus citations

Fingerprint

Dive into the research topics of 'Sub-10-nm half-pitch electron-beam lithography by using poly(methyl methacrylate) as a negative resist'. Together they form a unique fingerprint.

Engineering & Materials Science

Physics & Astronomy

Chemical Compounds