Submicron Co(TaC) line array produced by electron-beam direct writing

Y. Zhao; T. J. Zhou; J. P. Wang; J. T.L. Thong; X. F. Yao; T. C. Chong

doi:10.1063/1.1558254

Submicron Co(TaC) line array produced by electron-beam direct writing

Y. Zhao, T. J. Zhou, J. P. Wang, J. T.L. Thong, X. F. Yao, T. C. Chong

Research output: Contribution to journal › Article › peer-review

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Abstract

The preparation of (Co₆₀C₄₀)₉₇Ta₃ and Co₆₀C₄₀ films with thickness 30 nm was performed by cosputtering Co, Ta and C onto C-buffered glass substrates. It was found that the films became magnetic upon annealing. At the same annealing condition, the magnetic performance of annealed (Co₆₀C₄₀)₉₇Ta₃ films were better than that of annealed Co₆₀C₄₀ films.

Original language	English (US)
Pages (from-to)	7417-7419
Number of pages	3
Journal	Journal of Applied Physics
Volume	93
Issue number	10 2
DOIs	https://doi.org/10.1063/1.1558254
State	Published - May 15 2003
Externally published	Yes

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Submicron Co(TaC) line array produced by electron-beam direct writing

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