Substrate planarization studies on IBAD substrates

Chemical Compounds

• Ion Beam 61%
• Atomic Force Microscopy 33%
• Pressure 32%
• Surface Roughness 28%
• Plasma 26%
• Superconductor 15%
• Time 15%
• Crystalline Texture 13%
• Coil 13%
• Buffer Solution 9%
• Surface 8%

Engineering & Materials Science

• Ion beam assisted deposition 100%
• Substrates 39%
• Surface roughness 23%
• Plasmas 19%
• Critical currents 10%
• Buffer layers 10%
• Superconducting materials 9%
• Textures 5%
• Antennas 4%

Physics & Astronomy

• ion beams 43%
• radio frequencies 18%
• profilometers 18%
• Inconel (trademark) 17%
• atomic force microscopy 16%
• surface roughness 11%
• roughness 11%
• radio frequency discharge 9%
• critical current 6%
• tendencies 6%
• antennas 6%
• buffers 5%
• textures 5%
• coils 5%