Summary Abstract: Characterization of H₂0 plasma treated nickel oxide by angle resolved x-ray photoelectron spectroscopy

TY - JOUR

T1 - Summary Abstract

T2 - Characterization of H20 plasma treated nickel oxide by angle resolved x-ray photoelectron spectroscopy

AU - Haasch, Richard T.

AU - Evans, John F.

PY - 1988/5

Y1 - 1988/5

UR - http://www.scopus.com/inward/record.url?scp=84956037244&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84956037244&partnerID=8YFLogxK

U2 - 10.1116/1.575640

DO - 10.1116/1.575640

M3 - Article

AN - SCOPUS:84956037244

SN - 0734-2101

VL - 6

SP - 1074

EP - 1075

JO - Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

JF - Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

IS - 3

ER -