Summary Abstract: Characterization of H20 plasma treated nickel oxide by angle resolved x-ray photoelectron spectroscopy

Richard T. Haasch, John F. Evans

Research output: Contribution to journalArticlepeer-review

3 Scopus citations
Original languageEnglish (US)
Pages (from-to)1074-1075
Number of pages2
JournalJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume6
Issue number3
DOIs
StatePublished - May 1988

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