Surface-controlled photoelectrochemical microscopy of thin metal oxide films

Photoelectrochemical measurements on thin anodic TiO₂ films on Ti are presented and discussed. In particular, it is shown that the photoresponse is dominated by recombination processes at the metal oxide/electrolyte interface. The control by surface effects at the metal oxide/electrolyte interface is demonstrated by a new technique, in which the surface photoresponse is enhanced relative to that of the bulk film. Comparison of experimental results and analytical models shows that the Wilson model provides the basis for the physical description and future work.