Surface Sensitive Photoelectrochemical Imaging of the Derivatized Surface of TiO2 on Ti

Christopher S. McMillan; William H. Smyrl

doi:10.1149/1.2069214

Surface Sensitive Photoelectrochemical Imaging of the Derivatized Surface of TiO₂ on Ti

Christopher S. McMillan, William H. Smyrl

Chemical Engineering and Materials Science

Research output: Contribution to journal › Article › peer-review

5 Scopus citations

Abstract

An experimental method of examining surface heterogeneities of TiO₂ films on polycrystalline Ti is presented. Sensitization of the surface with hexacyanoferrate enables the surface properties of the films to be studied photoelectrochemically at subbandgap wavelengths, thereby excluding a response from the oxide interior. The combination of subbandgap photoelectrochemical microscopy of the derivatized surface with suprabandgap photoelectrochemical microscopy reveals significant surface recombination effects on the TiO₂ thin films.

Original language	English (US)
Pages (from-to)	L5-L6
Journal	Journal of the Electrochemical Society
Volume	139
Issue number	1
DOIs	https://doi.org/10.1149/1.2069214
State	Published - Jan 1992

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title = "Surface Sensitive Photoelectrochemical Imaging of the Derivatized Surface of TiO2 on Ti",

abstract = "An experimental method of examining surface heterogeneities of TiO2 films on polycrystalline Ti is presented. Sensitization of the surface with hexacyanoferrate enables the surface properties of the films to be studied photoelectrochemically at subbandgap wavelengths, thereby excluding a response from the oxide interior. The combination of subbandgap photoelectrochemical microscopy of the derivatized surface with suprabandgap photoelectrochemical microscopy reveals significant surface recombination effects on the TiO2 thin films.",

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year = "1992",

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