Synthesis and characterization of Si-containing block co-polymers with resolution beyond 10 nm

Yasunobu Someya; Yusuke Asano; Michael J. Maher; Gregory Blachut; Austin P. Lane; Stephen Sirard; Christopher J. Ellison; C. Grantwillson

doi:10.2494/photopolymer.29.701

Synthesis and characterization of Si-containing block co-polymers with resolution beyond 10 nm

Yasunobu Someya, Yusuke Asano, Michael J. Maher, Gregory Blachut, Austin P. Lane, Stephen Sirard, Christopher J. Ellison, C. Grantwillson

Chemical Engineering and Materials Science

Research output: Contribution to journal › Article › peer-review

3 Scopus citations

Abstract

Block co-polymers that include a Si-containing styrene monomer co-polymers were synthesized by living anionic polymerization. These polymers with very low polydispersity demonstrated lamella morphology that can be oriented by annealing with a neutral, crosslinkable surface treatment and a neutral top-coat.

Original language	English (US)
Pages (from-to)	701-704
Number of pages	4
Journal	Journal of Photopolymer Science and Technology
Volume	29
Issue number	5
DOIs	https://doi.org/10.2494/photopolymer.29.701
State	Published - 2016

Bibliographical note

Publisher Copyright:
© 2016SPST.

Keywords

Block co-polymer
Directed self-assembly
Patterning
Styrene

Access

10.2494/photopolymer.29.701

OpenUrl availability

Full text

Cite this

@article{9f9afcb3f87842448a32b948a8326972,

title = "Synthesis and characterization of Si-containing block co-polymers with resolution beyond 10 nm",

abstract = "Block co-polymers that include a Si-containing styrene monomer co-polymers were synthesized by living anionic polymerization. These polymers with very low polydispersity demonstrated lamella morphology that can be oriented by annealing with a neutral, crosslinkable surface treatment and a neutral top-coat.",

keywords = "Block co-polymer, Directed self-assembly, Patterning, Styrene",

author = "Yasunobu Someya and Yusuke Asano and Maher, {Michael J.} and Gregory Blachut and Lane, {Austin P.} and Stephen Sirard and Ellison, {Christopher J.} and C. Grantwillson",

note = "Publisher Copyright: {\textcopyright} 2016SPST.",

year = "2016",

doi = "10.2494/photopolymer.29.701",

language = "English (US)",

volume = "29",

pages = "701--704",

journal = "Journal of Photopolymer Science and Technology",

issn = "0914-9244",

publisher = "Tokai University",

number = "5",

}

TY - JOUR

T1 - Synthesis and characterization of Si-containing block co-polymers with resolution beyond 10 nm

AU - Someya, Yasunobu

AU - Asano, Yusuke

AU - Maher, Michael J.

AU - Blachut, Gregory

AU - Lane, Austin P.

AU - Sirard, Stephen

AU - Ellison, Christopher J.

AU - Grantwillson, C.

PY - 2016

Y1 - 2016

N2 - Block co-polymers that include a Si-containing styrene monomer co-polymers were synthesized by living anionic polymerization. These polymers with very low polydispersity demonstrated lamella morphology that can be oriented by annealing with a neutral, crosslinkable surface treatment and a neutral top-coat.

AB - Block co-polymers that include a Si-containing styrene monomer co-polymers were synthesized by living anionic polymerization. These polymers with very low polydispersity demonstrated lamella morphology that can be oriented by annealing with a neutral, crosslinkable surface treatment and a neutral top-coat.

KW - Block co-polymer

KW - Directed self-assembly

KW - Patterning

KW - Styrene

UR - http://www.scopus.com/inward/record.url?scp=84985028721&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84985028721&partnerID=8YFLogxK

U2 - 10.2494/photopolymer.29.701

DO - 10.2494/photopolymer.29.701

M3 - Article

AN - SCOPUS:84985028721

SN - 0914-9244

VL - 29

SP - 701

EP - 704

JO - Journal of Photopolymer Science and Technology

JF - Journal of Photopolymer Science and Technology

IS - 5

ER -

Synthesis and characterization of Si-containing block co-polymers with resolution beyond 10 nm

Abstract

Bibliographical note

Keywords

Access

OpenUrl availability

Other files and links

Fingerprint

Cite this