Temperature dependence of precursor-surface interactions in plasma deposition of silicon thin films

Physics & Astronomy

• surface reactions 100%
• temperature dependence 62%
• silicon 52%
• thin films 49%
• hydrogen 29%
• chemisorption 26%
• insertion 23%
• amorphous silicon 22%
• chemical reactions 21%
• density functional theory 18%
• molecular dynamics 17%
• temperature 14%
• simulation 9%

Chemical Compounds

• Plasma 60%
• Amorphous Silicon 43%
• Surface 30%
• Chemisorption 29%
• Molecular Dynamics 23%
• Amorphous Material 22%
• Simulation 20%
• Density Functional Theory 20%
• Hydrogen 16%
• Liquid Film 15%