The use of aluminum and gallium hydrides as molecular precursors has been an important development in the field of materials science. Alanes and gallanes have been used in a variety of techniques, such as chemical vapor deposition and solution-based methodologies, to synthesize materials ranging from aluminum thin films to nanocrystalline 13-15 materials. This review is intended to capture the general features of the use of alanes and gallanes in the synthesis of solid state materials. (C) 2000 Elsevier Science S.A.
Bibliographical noteFunding Information:
The authors’ research in this area was supported by the National Science Foundation and the Center for Interfacial Engineering at the University of Minnesota. The authors would also like to thank Ms. H.-Y. Park for her assistance in the preparation of this manuscript.
Copyright 2006 Elsevier B.V., All rights reserved.
- Materials science
- Solid state material