Thin Aluminum Nitride Film Resonators: Miniaturized High Sensitivity Mass Sensors

Ronald P. O'Toole; Stanley G. Burns; Ronald P. O'Toole; Stanley G. Burns; Marc D. Porter; Glenn J. Bastiaans; Marc D. Porter; Glenn J. Bastiaans; Marc D. Porter; Marc D. Porter

doi:10.1021/ac00035a017

Thin Aluminum Nitride Film Resonators: Miniaturized High Sensitivity Mass Sensors

Ronald P. O'Toole, Stanley G. Burns, Ronald P. O'Toole, Stanley G. Burns, Marc D. Porter, Glenn J. Bastiaans, Marc D. Porter, Glenn J. Bastiaans, Marc D. Porter, Marc D. Porter

Electrical Engineering

Research output: Contribution to journal › Article › peer-review

53 Scopus citations

Abstract

A miniaturised piezoelectric mass sensor has been developed that displays a very high mass sensitivity, S_m,. The sensor Is based upon thin film resonator (TFR) technology,1 which Is used to produce a gold-coated thin film (5.5 μm) resonator (TFR) of piezoelectric aluminum nitride In the shape of 400-μm squares. At this thickness, the TFRs support a standing bulk acoustic wave in a longitudinal mode at frequencies of ~ 1 GHz. Coatings of poly(methyl methacrylate) and spontaneously adsorbed monolayers from alkanethlols (CH₃-(CH₂)_nSH, n = 3, 17) were used for the evaluation of S_m. Results Indicated that the S_m(~-550 cm²/g) of the TFRs rivals those of the most sensitive mass sensors currently available, while offering such performance In a markedly smaller device. Coatings were also used to sorb a gaseous analyte (l.e. methanol) at the TFRs to test their potential as gas-phase sensors. Tests conducted using monolayers formed by the chemlsorption of a fluorlnated thiol (CF₃(CF₂)₇(CH₂)₂-SH) and an acld-termlnated thiol (HO₂C(CH₂)₁₅SH) at the gold electrodes demonstrated both the performance of the TFRs and a primitive manipulation of the sorption selectivity of the interfacial structure. Possible applications of the TFRs as mass sensors are examined based upon their high mass sensitivity and compatibility for device integration using semiconductor processing technology.

Original language	English (US)
Pages (from-to)	1289-1294
Number of pages	6
Journal	Analytical Chemistry
Volume	64
Issue number	11
DOIs	https://doi.org/10.1021/ac00035a017
State	Published - Jun 1992

Access

10.1021/ac00035a017

OpenUrl availability

Full text

Cite this

@article{b77e812fb8e845a08391a20543ca7de1,

title = "Thin Aluminum Nitride Film Resonators: Miniaturized High Sensitivity Mass Sensors",

abstract = "A miniaturised piezoelectric mass sensor has been developed that displays a very high mass sensitivity, Sm,. The sensor Is based upon thin film resonator (TFR) technology,1 which Is used to produce a gold-coated thin film (5.5 μm) resonator (TFR) of piezoelectric aluminum nitride In the shape of 400-μm squares. At this thickness, the TFRs support a standing bulk acoustic wave in a longitudinal mode at frequencies of ~ 1 GHz. Coatings of poly(methyl methacrylate) and spontaneously adsorbed monolayers from alkanethlols (CH3-(CH2)nSH, n = 3, 17) were used for the evaluation of Sm. Results Indicated that the Sm(~-550 cm2/g) of the TFRs rivals those of the most sensitive mass sensors currently available, while offering such performance In a markedly smaller device. Coatings were also used to sorb a gaseous analyte (l.e. methanol) at the TFRs to test their potential as gas-phase sensors. Tests conducted using monolayers formed by the chemlsorption of a fluorlnated thiol (CF3(CF2)7(CH2)2-SH) and an acld-termlnated thiol (HO2C(CH2)15SH) at the gold electrodes demonstrated both the performance of the TFRs and a primitive manipulation of the sorption selectivity of the interfacial structure. Possible applications of the TFRs as mass sensors are examined based upon their high mass sensitivity and compatibility for device integration using semiconductor processing technology.",

author = "O'Toole, {Ronald P.} and Burns, {Stanley G.} and O'Toole, {Ronald P.} and Burns, {Stanley G.} and Porter, {Marc D.} and Bastiaans, {Glenn J.} and Porter, {Marc D.} and Bastiaans, {Glenn J.} and Porter, {Marc D.} and Porter, {Marc D.}",

year = "1992",

month = jun,

doi = "10.1021/ac00035a017",

language = "English (US)",

volume = "64",

pages = "1289--1294",

journal = "Analytical Chemistry",

issn = "0003-2700",

number = "11",

}

TY - JOUR

T1 - Thin Aluminum Nitride Film Resonators

T2 - Miniaturized High Sensitivity Mass Sensors

AU - O'Toole, Ronald P.

AU - Burns, Stanley G.

AU - O'Toole, Ronald P.

AU - Burns, Stanley G.

AU - Porter, Marc D.

AU - Bastiaans, Glenn J.

AU - Porter, Marc D.

AU - Bastiaans, Glenn J.

AU - Porter, Marc D.

PY - 1992/6

Y1 - 1992/6

N2 - A miniaturised piezoelectric mass sensor has been developed that displays a very high mass sensitivity, Sm,. The sensor Is based upon thin film resonator (TFR) technology,1 which Is used to produce a gold-coated thin film (5.5 μm) resonator (TFR) of piezoelectric aluminum nitride In the shape of 400-μm squares. At this thickness, the TFRs support a standing bulk acoustic wave in a longitudinal mode at frequencies of ~ 1 GHz. Coatings of poly(methyl methacrylate) and spontaneously adsorbed monolayers from alkanethlols (CH3-(CH2)nSH, n = 3, 17) were used for the evaluation of Sm. Results Indicated that the Sm(~-550 cm2/g) of the TFRs rivals those of the most sensitive mass sensors currently available, while offering such performance In a markedly smaller device. Coatings were also used to sorb a gaseous analyte (l.e. methanol) at the TFRs to test their potential as gas-phase sensors. Tests conducted using monolayers formed by the chemlsorption of a fluorlnated thiol (CF3(CF2)7(CH2)2-SH) and an acld-termlnated thiol (HO2C(CH2)15SH) at the gold electrodes demonstrated both the performance of the TFRs and a primitive manipulation of the sorption selectivity of the interfacial structure. Possible applications of the TFRs as mass sensors are examined based upon their high mass sensitivity and compatibility for device integration using semiconductor processing technology.

AB - A miniaturised piezoelectric mass sensor has been developed that displays a very high mass sensitivity, Sm,. The sensor Is based upon thin film resonator (TFR) technology,1 which Is used to produce a gold-coated thin film (5.5 μm) resonator (TFR) of piezoelectric aluminum nitride In the shape of 400-μm squares. At this thickness, the TFRs support a standing bulk acoustic wave in a longitudinal mode at frequencies of ~ 1 GHz. Coatings of poly(methyl methacrylate) and spontaneously adsorbed monolayers from alkanethlols (CH3-(CH2)nSH, n = 3, 17) were used for the evaluation of Sm. Results Indicated that the Sm(~-550 cm2/g) of the TFRs rivals those of the most sensitive mass sensors currently available, while offering such performance In a markedly smaller device. Coatings were also used to sorb a gaseous analyte (l.e. methanol) at the TFRs to test their potential as gas-phase sensors. Tests conducted using monolayers formed by the chemlsorption of a fluorlnated thiol (CF3(CF2)7(CH2)2-SH) and an acld-termlnated thiol (HO2C(CH2)15SH) at the gold electrodes demonstrated both the performance of the TFRs and a primitive manipulation of the sorption selectivity of the interfacial structure. Possible applications of the TFRs as mass sensors are examined based upon their high mass sensitivity and compatibility for device integration using semiconductor processing technology.

UR - http://www.scopus.com/inward/record.url?scp=0001580739&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0001580739&partnerID=8YFLogxK

U2 - 10.1021/ac00035a017

DO - 10.1021/ac00035a017

M3 - Article

AN - SCOPUS:0001580739

SN - 0003-2700

VL - 64

SP - 1289

EP - 1294

JO - Analytical Chemistry

JF - Analytical Chemistry

IS - 11

ER -

Thin Aluminum Nitride Film Resonators: Miniaturized High Sensitivity Mass Sensors

Abstract

Access

OpenUrl availability

Other files and links

Fingerprint

Cite this