@inproceedings{43ae26395bc946bf9f7b0a79fab69a99,
title = "UHV-MOCVD growth and in situ characterization of epitaxial TiO2 films",
abstract = "Thin films of TiO2 were grown on SrTiO3 and Al2O3 using Ti(OC3H7)4 in the absence of any external oxygen source such as H2O or O2. On SrTiO3 (001), epitaxial anatase (001) formed even at temperatures (800°C) above the anatase to rutile phase transition temperature. In situ reflection high energy electron diffraction (RHEED) was used to monitor structural evolution during growth, and the films were further characterized by Auger electron spectroscopy (AES), transmission electron microscopy (TEM),and x-ray diffraction. Reaction kinetics were monitored using mass spectrometry, and these results, combined with temperature-programmed reaction spectroscopy, gave some insight into the deposition process.",
author = "Samuel Chen and Gysling, {H. J.} and Paz-Pujalt, {G. R.} and Blanton, {T. N.} and T. Castro and Chen, {K. M.} and C. Fictorie and Gladfelter, {W. L.} and A. Franciosi and Cohen, {P. I.} and Evans, {J. F.}",
year = "1993",
language = "English (US)",
isbn = "1558991751",
series = "Materials Research Society Symposium Proceedings",
publisher = "Publ by Materials Research Society",
pages = "173--178",
editor = "Atwater, {Harry A.} and Eric Chason and Grabow, {Marcia H.} and Lagally, {Max G.}",
booktitle = "Evolution of Surface and Thin Film Microstructure",
note = "Proceedings of the 1992 Fall Meeting of the Materials Research Society ; Conference date: 30-11-1992 Through 04-12-1992",
}