Ultrahigh-vacuum evaporation system with low-temperature measurement capability

B. G. Orr, A. M. Goldman

Research output: Contribution to journalArticlepeer-review

24 Scopus citations

Abstract

An ultrahigh-vacuum system has been constructed and outfitted with molecular beam sources and surface analysis equipment [Auger electron spectroscopy (AES) and reflection high-energy electron diffraction (RHEED)]. The sample insertion system is a low-temperature apparatus. With this equipment, films can be grown in the 10-11-10 -9-Torr range with substrate temperatures at 4.2-20 K. A modification of the system will permit growth at elevated temperatures followed by in situ low-temperature measurements. The design of the low-temperature apparatus permits extensive measurements to be taken in an environment in which the temperature can be controlled over a range from 0.3 to 300 K and the magnetic field from 10-7 to 6 T.

Original languageEnglish (US)
Pages (from-to)1288-1290
Number of pages3
JournalReview of Scientific Instruments
Volume56
Issue number6
DOIs
StatePublished - 1985

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