Aluminum Film-Over-Nanosphere Substrates for Deep-UV Surface-Enhanced Resonance Raman Spectroscopy

Bhavya Sharma; M. Fernanda Cardinal; Michael B. Ross; Alyssa B. Zrimsek; Sergei V. Bykov; David Punihaole; Sanford A. Asher; George C. Schatz; Richard P. Van Duyne

doi:10.1021/acs.nanolett.6b04296

Aluminum Film-Over-Nanosphere Substrates for Deep-UV Surface-Enhanced Resonance Raman Spectroscopy

Bhavya Sharma, M. Fernanda Cardinal, Michael B. Ross, Alyssa B. Zrimsek, Sergei V. Bykov, David Punihaole, Sanford A. Asher, George C. Schatz, Richard P. Van Duyne

Chemistry (Twin Cities)

Research output: Contribution to journal › Article › peer-review

83 Scopus citations

Abstract

We report here the first fabrication of aluminum film-over nanosphere (AlFON) substrates for UV surface-enhanced resonance Raman scattering (UVSERRS) at the deepest UV wavelength used to date (δ_ex = 229 nm). We characterize the AlFONs fabricated with two different support microsphere sizes using localized surface plasmon resonance spectroscopy, electron microscopy, SERRS of adenine, tris(bipyridine)ruthenium(II), and trans-1,2-bis(4-pyridyl)-ethylene, SERS of 6-mercapto-1-hexanol (as a nonresonant molecule), and dielectric function analysis. We find that AlFONs fabricated with the 210 nm microspheres generate an enhancement factor of approximately 10^4-5, which combined with resonance enhancement of the adsorbates provides enhancement factors greater than 10⁶. These experimental results are supported by theoretical analysis of the dielectric function. Hence our results demonstrate the advantages of using AlFON substrates for deep UVSERRS enhancement and contribute to broadening the SERS application range with tunable and affordable substrates.

Original language	English (US)
Pages (from-to)	7968-7973
Number of pages	6
Journal	Nano letters
Volume	16
Issue number	12
DOIs	https://doi.org/10.1021/acs.nanolett.6b04296
State	Published - Dec 14 2016

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Publisher Copyright:
© 2016 American Chemical Society.

Keywords

UV resonance Raman spectroscopy (UVRRS)
aluminum plasmonics
film-overnanosphere substrates
surface-enhanced Raman spectroscopy (SERS)

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title = "Aluminum Film-Over-Nanosphere Substrates for Deep-UV Surface-Enhanced Resonance Raman Spectroscopy",

abstract = "We report here the first fabrication of aluminum film-over nanosphere (AlFON) substrates for UV surface-enhanced resonance Raman scattering (UVSERRS) at the deepest UV wavelength used to date (δex = 229 nm). We characterize the AlFONs fabricated with two different support microsphere sizes using localized surface plasmon resonance spectroscopy, electron microscopy, SERRS of adenine, tris(bipyridine)ruthenium(II), and trans-1,2-bis(4-pyridyl)-ethylene, SERS of 6-mercapto-1-hexanol (as a nonresonant molecule), and dielectric function analysis. We find that AlFONs fabricated with the 210 nm microspheres generate an enhancement factor of approximately 104-5, which combined with resonance enhancement of the adsorbates provides enhancement factors greater than 106. These experimental results are supported by theoretical analysis of the dielectric function. Hence our results demonstrate the advantages of using AlFON substrates for deep UVSERRS enhancement and contribute to broadening the SERS application range with tunable and affordable substrates.",

keywords = "UV resonance Raman spectroscopy (UVRRS), aluminum plasmonics, film-overnanosphere substrates, surface-enhanced Raman spectroscopy (SERS)",

author = "Bhavya Sharma and Cardinal, {M. Fernanda} and Ross, {Michael B.} and Zrimsek, {Alyssa B.} and Bykov, {Sergei V.} and David Punihaole and Asher, {Sanford A.} and Schatz, {George C.} and {Van Duyne}, {Richard P.}",

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T1 - Aluminum Film-Over-Nanosphere Substrates for Deep-UV Surface-Enhanced Resonance Raman Spectroscopy

AU - Sharma, Bhavya

AU - Cardinal, M. Fernanda

AU - Ross, Michael B.

AU - Zrimsek, Alyssa B.

AU - Bykov, Sergei V.

AU - Punihaole, David

AU - Asher, Sanford A.

AU - Schatz, George C.

AU - Van Duyne, Richard P.

PY - 2016/12/14

Y1 - 2016/12/14

N2 - We report here the first fabrication of aluminum film-over nanosphere (AlFON) substrates for UV surface-enhanced resonance Raman scattering (UVSERRS) at the deepest UV wavelength used to date (δex = 229 nm). We characterize the AlFONs fabricated with two different support microsphere sizes using localized surface plasmon resonance spectroscopy, electron microscopy, SERRS of adenine, tris(bipyridine)ruthenium(II), and trans-1,2-bis(4-pyridyl)-ethylene, SERS of 6-mercapto-1-hexanol (as a nonresonant molecule), and dielectric function analysis. We find that AlFONs fabricated with the 210 nm microspheres generate an enhancement factor of approximately 104-5, which combined with resonance enhancement of the adsorbates provides enhancement factors greater than 106. These experimental results are supported by theoretical analysis of the dielectric function. Hence our results demonstrate the advantages of using AlFON substrates for deep UVSERRS enhancement and contribute to broadening the SERS application range with tunable and affordable substrates.

AB - We report here the first fabrication of aluminum film-over nanosphere (AlFON) substrates for UV surface-enhanced resonance Raman scattering (UVSERRS) at the deepest UV wavelength used to date (δex = 229 nm). We characterize the AlFONs fabricated with two different support microsphere sizes using localized surface plasmon resonance spectroscopy, electron microscopy, SERRS of adenine, tris(bipyridine)ruthenium(II), and trans-1,2-bis(4-pyridyl)-ethylene, SERS of 6-mercapto-1-hexanol (as a nonresonant molecule), and dielectric function analysis. We find that AlFONs fabricated with the 210 nm microspheres generate an enhancement factor of approximately 104-5, which combined with resonance enhancement of the adsorbates provides enhancement factors greater than 106. These experimental results are supported by theoretical analysis of the dielectric function. Hence our results demonstrate the advantages of using AlFON substrates for deep UVSERRS enhancement and contribute to broadening the SERS application range with tunable and affordable substrates.

KW - UV resonance Raman spectroscopy (UVRRS)

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KW - film-overnanosphere substrates

KW - surface-enhanced Raman spectroscopy (SERS)

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Aluminum Film-Over-Nanosphere Substrates for Deep-UV Surface-Enhanced Resonance Raman Spectroscopy

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