Atomic layer deposition: A versatile technique for plasmonics and nanobiotechnology

Hyungsoon Im, Nathan J. Wittenberg, Nathan C. Lindquist, Sang Hyun Oh

Research output: Contribution to journalReview articlepeer-review

40 Scopus citations

Abstract

Although atomic layer deposition (ALD) has been used for many years as an industrial manufacturing method for microprocessors and displays, this versatile technique is finding increased use in the emerging fields of plasmonics and nanobiotechnology. In particular, ALD coatings can modify metallic surfaces to tune their optical and plasmonic properties, to protect them against unwanted oxidation and contamination, or to create biocompatible surfaces. Furthermore, ALD is unique among thin film deposition techniques in its ability to meet the processing demands for engineering nanoplasmonic devices, offering conformal deposition of dense and ultrathin films on high-aspect-ratio nanostructures at temperatures below 100 °C. In this review, we present key features of ALD and describe how it could benefit future applications in plasmonics, nanosciences, and biotechnology.

Original languageEnglish (US)
Pages (from-to)663-671
Number of pages9
JournalJournal of Materials Research
Volume27
Issue number4
DOIs
StatePublished - Feb 28 2012

Keywords

  • Atomic layer deposition
  • Nanostructure
  • Sensor

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