DAMPED OSCILLATIONS IN REFLECTION HIGH ENERGY ELECTRON DIFFRACTION DURING GaAs MBE.

Oscillations in the time evolution of electron diffraction during MBE growth of GaAs are shown to be related to periodic variations in the step distributions on GaAs surfaces during epitaxial growth. Unintentionally doped GaAs surfaces were first prepared by MBE. Then the Ga flux is interrupted until an instrument limited diffraction pattern was obtained. During this process the angular width of the specular beam was measured versus time. When the Ga flux is reapplied there are intensity oscillations that are weak near the Bragg angle. At the Bragg angle, where the diffraction is insensitive to surface steps, the length of the specular RHEED streak does not change. At angles between the Bragg angles, where steps lengthen the streaks, there are periodic variations in the streak length. We interpret the results in terms of a model in which a partially completed surface has a step distribution with smaller average terrace lengths than a completed surface.