Electron-beam lithography for thick refractive optical elements in SU-8

Eric A. Shields, Fred Williamson, James R Leger

Research output: Contribution to journalArticlepeer-review

18 Scopus citations

Abstract

The fabrication of refractive optical elements in SU-8 resist using electron-beam lithography was discussed. It was found that the elements all perform near the diffraction limit with rms surface variations between 1/10 wave and 1/7 wave. The electron scattering from the thick resist was measured and shown to limit the technique to optical elements with relatively smooth surface figures.

Original languageEnglish (US)
Pages (from-to)1453-1458
Number of pages6
JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume21
Issue number4
StatePublished - Jul 1 2003

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