The fabrication of refractive optical elements in SU-8 resist using electron-beam lithography was discussed. It was found that the elements all perform near the diffraction limit with rms surface variations between 1/10 wave and 1/7 wave. The electron scattering from the thick resist was measured and shown to limit the technique to optical elements with relatively smooth surface figures.
|Original language||English (US)|
|Number of pages||6|
|Journal||Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures|
|State||Published - Jul 1 2003|