Epitaxial high saturation magnetization FeN thin films on Fe(001) seeded GaAs(001) single crystal wafer using facing target sputterings

Nian Ji, Yiming Wu, Jian Ping Wang

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Abstract

It was demonstrated that Fe-N martensite (α′) films were grown epitaxially on Fe(001) seeded GaAs(001) single crystal wafer by using a facing target sputtering method. X-ray diffraction pattern implies an increasing c lattice constant as the N concentration increases in the films. Partially ordered Fe16N2 films were synthesized after in situ post-annealing the as-sputtered samples with pure Fe8N phase. Multiple characterization techniques including XRD, XRR, TEM, and AES were used to determine the sample structure. The saturation magnetization of films with pure Fe8N phase measured by VSM was evaluated in the range of 2.0-2.2 T. The post annealed films show systematic and dramatic increase on the saturation magnetization, which possess an average value of 2.6 T. These observations support the existence of giant saturation magnetization in α″-Fe16N2 phase that is consistent with a recent proposed cluster-atom model and the first principles calculation [N. Ji, X. Q. Liu, and J. P. Wang, New J. Phys. 12 063032 (2010)].

Original languageEnglish (US)
Article number07B767
JournalJournal of Applied Physics
Volume109
Issue number7
DOIs
StatePublished - Apr 1 2011

Bibliographical note

Funding Information:
The authors acknowledge Dr. Edgar Lara-Curzio and Dr. Lawrence Allard, Jr. for HR-TEM. The work was partially supported by the DOE, Office of Basic Energy Sciences and NSF MRSEC program. The authors would like to thank Professor Jack Judy, Dr. Mark Kief, and Dr. Yinjian Chen for useful conversations. All the samples were prepared before June 2010.

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