Kinetic and mechanistic study of the chemical vapor deposition of titanium dioxide thin films using tetrakis-(isopropoxo)-titanium(IV)

Engineering & Materials Science

• Titanium dioxide 100%
• Chemical vapor deposition 89%
• Titanium 74%
• Thin films 72%
• Propylene 59%
• Reflection high energy electron diffraction 52%
• Single crystal surfaces 51%
• Molecular beams 45%
• Reaction products 33%
• Temperature 30%
• Single crystals 29%
• Spectroscopy 28%
• Activation energy 26%
• Scattering 24%
• Substrates 18%
• Water 13%

Physics & Astronomy

• titanium oxides 79%
• titanium 63%
• vapor deposition 58%
• products 49%
• single crystals 47%
• kinetics 45%
• reaction products 43%
• crystal surfaces 41%
• rutile 40%
• thin films 39%
• molecular beams 39%
• high energy electrons 38%
• electron diffraction 32%
• activation energy 28%
• probes 23%
• water 21%
• spectroscopy 20%
• scattering 19%
• temperature 11%

Chemical Compounds

• Chemical Vapour Deposition 68%
• Titanium Dioxide 63%
• Propene 42%
• Reflection High Energy Electron Diffraction 41%
• Single Crystal Surface 33%
• Molecular Beam 30%
• Rutile 25%
• Polycrystalline Solid 22%
• Single Crystalline Solid 18%
• Reaction Activation Energy 17%
• Spectroscopy 16%
• Probe 15%
• Surface 8%