Fingerprint
Dive into the research topics of 'Metrology for electron-beam lithography and resist contrast at the sub-10 nm scale'. Together they form a unique fingerprint.- Sort by
- Weight
- Alphabetically
Metrology for electron-beam lithography and resist contrast at the sub-10 nm scale
Huigao Duan, Vitor R. Manfrinato, Joel K.W. Yang, Donald Winston, Bryan M. Cord, Karl K. Berggren
Research output: Contribution to journal › Article › peer-review
31
Scopus
citations