Engineering & Materials Science
Reactive sputtering
100%
Ruthenium
95%
Aluminum oxide
60%
Microstructure
42%
Oxygen
15%
Grain boundaries
12%
Growth temperature
10%
Temperature
10%
Lattice constants
9%
Substrates
8%
Stoichiometry
8%
Chemical analysis
8%
Crystalline materials
6%
Transmission electron microscopy
6%
Hydrogen
5%
Defects
4%
Physics & Astronomy
ruthenium
77%
dioxides
68%
sputtering
49%
microstructure
37%
oxygen
11%
alignment
9%
grain boundaries
9%
room temperature
7%
stoichiometry
6%
coalescing
6%
rooms
5%
temperature
5%
lattice parameters
5%
transmission electron microscopy
4%
hydrogen
3%
defects
3%
Chemical Compounds
Reactive Sputtering
94%
Microstructure
42%
Liquid Film
30%
Grain Boundary
13%
Amorphous Material
8%
Ambient Reaction Temperature
7%
Lattice Parameter
6%
Reaction Stoichiometry
5%
Transmission Electron Microscopy
4%
Hydrogen
3%
Dioxygen
3%