Organometallic Azides as Precursors for Aluminum Nitride Thin Films

David C. Boyd, Richard T. Haasch, Daniel R. Mantell, Roland K. Schulze, John F Evans, Wayne L Gladfelter

Research output: Contribution to journalArticlepeer-review

106 Scopus citations

Fingerprint

Dive into the research topics of 'Organometallic Azides as Precursors for Aluminum Nitride Thin Films'. Together they form a unique fingerprint.

Engineering & Materials Science

Chemical Compounds