Particle beam mass spectrometry of submicron particles formed during LPCVD of polysilicon films

Paul J. Ziemann, Peng Liu, Sandeep Nijhawan, David B Kittelson, Peter H McMurry, Stephen A Campbell

Research output: Contribution to journalConference articlepeer-review

8 Scopus citations

Abstract

We have recently developed a particle beam mass spectrometer that can be used to size and detect ultrafine particles (approximately 0.01-0.5 μm) in low-pressure environments, such as those often encountered in semiconductor processing equipment. The instrument can be used as a particle detector in process control, and as a toll for investigating particle formation in processing equipment. In this paper we describe the operation of the instrument and the techniques used for calibration, data analysis, and measurements of particle size distributions. We also present the results of recent investigations of particle formation during LPCVD of polysilicon films.

Original languageEnglish (US)
Pages (from-to)22-29
Number of pages8
JournalInstitute of Environmental Sciences - Proceedings, Annual Technical Meeting
StatePublished - Dec 1 1995
EventProceedings of the 41st Annual Technical Meeting of the Institute of Environmental Sciences - Anaheim, CA, USA
Duration: Apr 30 1995May 5 1995

Fingerprint Dive into the research topics of 'Particle beam mass spectrometry of submicron particles formed during LPCVD of polysilicon films'. Together they form a unique fingerprint.

Cite this