TY - JOUR
T1 - Selective Metallization by Chemical Vapor Deposition
AU - Gladfelter, Wayne L.
PY - 1993/1/1
Y1 - 1993/1/1
N2 - The selective growth of metal films by chemical vapor deposition processes is reviewed. A working definition of selectivity, based on the relative rates of nucleation on the growth and nongrowth surfaces, is proposed. After consideration of the factors that effect nucleation and a brief description of the methods used to measure selectivity, a review of the selective depositions of tungsten, copper, and aluminum will be presented.
AB - The selective growth of metal films by chemical vapor deposition processes is reviewed. A working definition of selectivity, based on the relative rates of nucleation on the growth and nongrowth surfaces, is proposed. After consideration of the factors that effect nucleation and a brief description of the methods used to measure selectivity, a review of the selective depositions of tungsten, copper, and aluminum will be presented.
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U2 - 10.1021/cm00034a004
DO - 10.1021/cm00034a004
M3 - Article
AN - SCOPUS:0000852701
SN - 0897-4756
VL - 5
SP - 1372
EP - 1388
JO - Chemistry of Materials
JF - Chemistry of Materials
IS - 10
ER -