Selective Metallization by Chemical Vapor Deposition

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Abstract

The selective growth of metal films by chemical vapor deposition processes is reviewed. A working definition of selectivity, based on the relative rates of nucleation on the growth and nongrowth surfaces, is proposed. After consideration of the factors that effect nucleation and a brief description of the methods used to measure selectivity, a review of the selective depositions of tungsten, copper, and aluminum will be presented.

Original languageEnglish (US)
Pages (from-to)1372-1388
Number of pages17
JournalChemistry of Materials
Volume5
Issue number10
DOIs
StatePublished - Jan 1 1993

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