Structure and properties of ternary manganese nitride Mn ₃CuN_y thin films fabricated by facing target magnetron sputtering

Engineering & Materials Science

• Magnetron sputtering 100%
• Nitrides 90%
• Manganese 89%
• Thin films 70%
• Thermal expansion 30%
• Temperature 30%
• Lattice constants 22%
• Crystal structure 19%
• X ray photoelectron spectroscopy 18%
• Single crystals 17%
• Crystalline materials 15%
• X ray diffraction 14%
• Semiconductor materials 13%
• Textures 12%
• Substrates 10%
• Chemical analysis 9%

Physics & Astronomy

• manganese 75%
• nitrides 69%
• magnetron sputtering 62%
• thin films 38%
• thermal expansion 32%
• electrical resistivity 23%
• temperature 22%
• x rays 16%
• textures 15%
• photoelectron spectroscopy 15%
• crystal structure 14%
• temperature dependence 12%
• single crystals 11%
• coefficients 10%
• diffraction 10%

Chemical Compounds

• Nitride 72%
• Ferrimagnetic 32%
• Thermal Expansion Coefficient 29%
• Lattice Constant 27%
• Thermal Expansion 26%
• Crystalline Texture 24%
• Single Crystalline Solid 17%
• X-Ray Photoelectron Spectroscopy 17%
• Crystal Structure 12%
• X-Ray Diffraction 12%