TY - JOUR
T1 - Synthesis and thin-film orientation of poly(styrene-block- trimethylsilylisoprene)
AU - Bates, Christopher M.
AU - Pantoja, Marco A Bedolla
AU - Strahan, Jeffrey R.
AU - Dean, Leon M.
AU - Mueller, Brennen K.
AU - Ellison, Christopher J.
AU - Nealey, Paul F.
AU - Willson, C. Grant
PY - 2013/1/15
Y1 - 2013/1/15
N2 - The successful synthesis, characterization, and directed self-assembly of a silicon-containing block copolymer, poly(styrene-block-trimethylsilylisoprene) (P(S-b-TMSI)), which has much higher oxygen etch contrast than the de facto standard, poly(styrene-block-methyl methacrylate) is reported. A Sakurai, Grignard-type coupling reaction provided the key monomer in good yield. Living anionic polymerization was employed to prepare the block copolymer, which has very low polydispersity. P(S-b-TMSI) was successfully ordered and oriented by directed self-assembly.
AB - The successful synthesis, characterization, and directed self-assembly of a silicon-containing block copolymer, poly(styrene-block-trimethylsilylisoprene) (P(S-b-TMSI)), which has much higher oxygen etch contrast than the de facto standard, poly(styrene-block-methyl methacrylate) is reported. A Sakurai, Grignard-type coupling reaction provided the key monomer in good yield. Living anionic polymerization was employed to prepare the block copolymer, which has very low polydispersity. P(S-b-TMSI) was successfully ordered and oriented by directed self-assembly.
KW - anionic polymerization
KW - diblock copolymers
KW - directed self-assembly
KW - lithography
KW - trimethylsilylisoprene
UR - http://www.scopus.com/inward/record.url?scp=84870424237&partnerID=8YFLogxK
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U2 - 10.1002/pola.26375
DO - 10.1002/pola.26375
M3 - Article
AN - SCOPUS:84870424237
SN - 0887-624X
VL - 51
SP - 290
EP - 297
JO - Journal of Polymer Science, Part A: Polymer Chemistry
JF - Journal of Polymer Science, Part A: Polymer Chemistry
IS - 2
ER -