Thermal plasma chemical vapor deposition of superhard nanostructured Si-C-N coatings

Engineering & Materials Science

• Chemical vapor deposition 81%
• Plasmas 64%
• Coatings 52%
• Hot Temperature 33%
• Silicon 27%
• Molybdenum 27%
• Indentation 25%
• Nitrogen 21%
• Nitrogen plasma 21%
• Plasma torches 17%
• Composite films 16%
• Acetylene 15%
• Mechanical properties 15%
• Fourier transform infrared spectroscopy 14%
• Silicon nitride 14%
• Argon 13%
• Silicon carbide 12%
• Crystalline materials 12%
• X ray diffraction 11%
• Microscopes 11%
• Elastic moduli 9%
• Hardness 9%
• Scanning 9%
• Carbon 8%
• Substrates 8%
• Chemical analysis 7%
• Composite materials 6%

Physics & Astronomy

• thermal plasmas 84%
• vapor deposition 53%
• coatings 47%
• indentation 19%
• molybdenum 19%
• silicon tetrachloride 16%
• nitrogen 14%
• mechanical properties 13%
• torches 13%
• plasma torches 12%
• nitrogen plasma 12%
• composite materials 12%
• argon plasma 11%
• acetylene 11%
• silicon 10%
• optical microscopes 10%
• methylidyne 10%
• silicon nitrides 9%
• silicon carbides 9%
• infrared spectroscopy 9%
• modulus of elasticity 8%
• electron microscopes 7%
• hardness 7%
• reactors 7%
• injection 7%
• rings 6%
• carbon 6%
• scanning 6%
• probes 6%
• cross sections 5%
• configurations 5%
• diffraction 5%
• x rays 4%

Chemical Compounds

• Thermal Plasma 100%
• Plasma Chemical Vapour Deposition 95%
• Coating Agent 42%
• Liquid Film 34%
• Plasma Torch 14%
• Torch 13%
• Hexamethyldisilazane 13%
• Vapor Deposition Process 12%
• Nitrogen 12%
• Silicon Carbide 11%
• Composite Material 10%
• Nitride 9%
• Acetylene 9%
• Amorphous Material 6%
• Flow 6%
• Plasma 6%
• Probe 6%
• Fourier Transform Infrared Spectroscopy 5%
• Electron Particle 5%
• X-Ray Diffraction 4%