Abstract
Block copolymers with lines and spaces in the 100 Å regime have been oriented using a perfectly neutral top coat and bottom coat and these structures have been successfully developed with RIE to provide high aspect ratio topographic features. Under these conditions, the materials can be annealed in less than 60 seconds. Future work will be directed toward continued increases in χ and development of simple and efficient processes for orienting these structures.
Original language | English (US) |
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Pages (from-to) | 415-418 |
Number of pages | 4 |
Journal | Journal of Photopolymer Science and Technology |
Volume | 27 |
Issue number | 4 |
DOIs | |
State | Published - Sep 13 2014 |
Bibliographical note
Publisher Copyright:© 2014SPST.
Keywords
- Block copolymers
- DSA
- Etching
- Lithography