Design and performance of a molecular beam epitaxy system for metallic heterostructure deposition illustrated by a study of the controlled epitaxy of Cu(111)/Al₂O₃(0001)

Engineering & Materials Science

• Molecular beam epitaxy 100%
• Epitaxial growth 90%
• Heterojunctions 84%
• Aluminum oxide 61%
• Deposition rates 27%
• Masks 20%
• Surface roughness 17%
• Substrates 15%
• Metals 13%
• Temperature 8%
• Costs 8%

Chemical Compounds

• Molecular Beam Epitaxy 92%
• Epitaxial Growth 78%
• Surface Roughness 64%
• Crystallite 53%
• Ambient Reaction Temperature 36%
• Metal 29%

Physics & Astronomy

• epitaxy 63%
• molecular beam epitaxy 54%
• performance 28%
• magnetic metals 22%
• compatibility 16%
• crystallites 14%
• masks 13%
• surface roughness 13%
• costs 12%
• room temperature 8%