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Plasma and surface diagnostics during plasma-enhanced chemical vapor deposition of SiO
2
from SiH
4
/O
2
/Ar discharges
Sang M. Han,
Eray S. Aydil
Chemical Engineering and Materials Science
Research output
:
Contribution to journal
›
Article
›
peer-review
25
Scopus citations
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Dive into the research topics of 'Plasma and surface diagnostics during plasma-enhanced chemical vapor deposition of SiO
2
from SiH
4
/O
2
/Ar discharges'. Together they form a unique fingerprint.
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Engineering & Materials Science
Plasma diagnostics
100%
Plasma enhanced chemical vapor deposition
79%
Silanes
39%
Fluxes
25%
Langmuir probes
11%
Film growth
9%
Substrates
8%
Fourier transform infrared spectroscopy
7%
Gas mixtures
7%
Oxidation
5%
Oxides
5%
Oxygen
5%
Physics & Astronomy
plasma diagnostics
67%
vapor deposition
42%
silanes
27%
fragments
15%
electrostatic probes
6%
hydrides
6%
gas mixtures
5%
light emission
5%
infrared spectroscopy
5%
oxidation
4%
oxides
3%
oxygen
3%
silicon
3%
Chemical Compounds
Plasma Enhanced Chemical Vapour Deposition
67%
Liquid Film
21%
Surface
17%
Silane
17%
Silicon Hydride
9%
Attenuated Total Reflection
6%
Hydroxyl
5%
Probe
3%
Fourier Transform Infrared Spectroscopy
3%
Oxide
3%
Gas
3%
Oxidation Reaction
2%